METHOD FOR FORMING FINE CONTACT FOR HIGHLY INTEGRATED SEMICONDUCTOR DEVICE,申请号KR1019920018285-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	METHOD FOR FORMING FINE CONTACT FOR HIGHLY INTEGRATED SEMICONDUCTOR DEVICE
摘要
申请公布号	KR1019950010852(B1)	申请公布日期	1995.09.25
申请号	KR1019920018285	申请日期	1992.10.06
申请人		发明人
分类号		主分类号
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Preparation of cyclohexanone and cyclohexanol

Process for dehydrogenation of alkylaromatics

Methylmethacrylate/phenylmaleimide copolymer and styrene/maleic anhydride copolymer containing polymer alloys

Hydrogen-phosphide releasing compositions and processes for their production and use

Method and apparatus for the filtration of a suspension by a granular filtrating layer

Answering device

Information display apparatus

Protective circuit for the overvoltage protection of a subscriber line interconnect circuit

Gas laser including means for magnetic deflection of ions

Noise compensation arrangement

Device for measuring liquid flow volume with temperature compensating

Clock, in particular desk or wall clock, with one or more analog time indicating devices

Film wind-up control apparatus for a camera

Flashmatic device for cameras

Digital induction logging tool

Electro-optical compass card wherein transmissive member has random patterns that repeat for particular rotational positions

Preparation of metal alkyls

Use of bis-platinum complexes as antitumor agents

Pressure sensitive label stock material possessing a wrinkle-resistant lustrous, opaque laminate film facing