发明名称 Method of evaluating lifetime of semiconductor material and apparatus for the same
摘要 A method of and apparatus for evaluating the lifetime of a semiconductor material which is capable of measuring, in a non-contact and non-destructive manner, the lifetime of a surface thin-layer portion so as to evaluate the quality of a semiconductor device formed of an epitaxial wafer or a thin device-forming material. Light within a short-wavelength region is radiated for a short period of time on the surface of a semiconductor material to be evaluated, thereby generating carriers effectively on the surface and in a surface thin-layer. An electromagnetic wave within a millimeter to sub-millimeter wave region is projected onto the surface, and a wave reflected from the surface is measured to obtain a decay curve of the carriers. On the basis of the carrier decay curve, the lifetime of the surface as well as a surface thin-layer portion of the semiconductor material is evaluated.
申请公布号 US5451886(A) 申请公布日期 1995.09.19
申请号 US19930077062 申请日期 1993.06.16
申请人 SCHOOL JUDICIAL PERSON IKUTOKU GAKUEN;SEMITEX CO., LTD. 发明人 OGITA, YOICHIRO;KUSAMA, TATEO
分类号 G01N21/00;G01N22/00;G01R31/265;H01L21/66;(IPC1-7):G01R31/26 主分类号 G01N21/00
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