| 摘要 |
PURPOSE:To generate a material for forming resist without using a large quantity of solvent by pulverizing materials for forming the resist to powder states, then cleaning the materials with poor solvent to remove impurities contained in the materials, and then drying it. CONSTITUTION:After materials for forming resist are pulverized to powder states, the materials are cleaned with poor solvent to remove impurities contained in the materials, and then dried. In this case, the materials include a base material resin for forming the resist, photosensitive agent, sensitizer, crosslinking agent, dissolution inhibitor and surfactant. The materials are pulverized by a freezing drying method, and the poor solvent is alcohol or water. Since the powder obtained by the method becomes a completely powder state, the solvent can spread to corners of polymer substance, and hence its cleaning effect is high and a production efficiency is excellent. |
