Verfahren zur Herstellung einer Epitaxialscheibe vom doppelten Heteroübergangs-Typ.,申请号DE19896023765-传众专利搜索

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发明名称	Verfahren zur Herstellung einer Epitaxialscheibe vom doppelten Heteroübergangs-Typ.
摘要
申请公布号	DE68923765(D1)	申请公布日期	1995.09.14
申请号	DE19896023765	申请日期	1989.11.27
申请人	MITSUBISHI CHEMICAL CORP., TOKIO/TOKYO, JP	发明人	SATO, TADASHIGE MITSUBISHI MONSANTO, TSUCHIURA-SHI IBARAGI, JP;ISHIWATARI, TOSHIO, ABIKO-SHI CHIBA, JP;FUJITA, HISANORI, USHIKU-SHI IBARAGI, JP
分类号	H01L21/205;H01L21/208;H01L33/30;H01L33/34;H01L33/56;(IPC1-7):H01L33/00;H01L21/18	主分类号	H01L21/205
代理机构		代理人
主权项
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