发明名称 PATTERN CORRECTION
摘要 PURPOSE:To correct a pattern by irradiating the pattern material layer part corresponding to the defect of the pattern with laser beam. CONSTITUTION:Laser beam is irradiated from the part above defect 9 of pattern 8 on substrate 7 through pattern materials 6. Laser beam is condensed by a lens to melt materials 6, and the surface tension is utilized to print materials 6 to the substrate, thereby correcting defect 9. Thus, pattern materials 6 are melted or are made into gas by laser beam, and materials 6 are printed to the substrate, so that an effective correction can be performed.
申请公布号 JPS5457964(A) 申请公布日期 1979.05.10
申请号 JP19770124794 申请日期 1977.10.18
申请人 FUJITSU LTD 发明人 NAKASHIMA MASAHITO;FUJIWARA KATSUMI
分类号 G01B9/02;G01B11/26;G03F1/00;G03F1/72;H01L21/027;H01L21/302;H05K13/00 主分类号 G01B9/02
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