| 摘要 |
An electron beam exposure system includes an electron beam shaping mask having a plurality of apertures for shaping an electron beam, a blanking plate disposed between the electron beam shaping mask and an object for inhibiting the passage of the electron beam deviated from a predetermined optical axis, a current adding circuit supplied with a first current induced in the electron beam shaping mask as a result of capturing of the electron beam and a second current induced in the blanking plate as a result of capturing of the electron beam for generating a third current as a sum of the first and second currents, a current/voltage converter for generating a first pulse signal in response to the third current, a first counter supplied with the first pulse signals for counting the first pulse signals and outputting a first count value, a second counting circuit supplied with a second pulse signal corresponding to the driving signal, for counting the second pulse signals and generating a second count value representing the count result, and a comparator supplied with the first and second count values for comparing the first count value with the second count value. The comparator issues an alarm indicating the failure of exposure on the basis of the result of comparison.
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