| 摘要 |
A method of manufacturing a solid state image sensing device comprising the steps of: forming and maintaining a color filter layer, a lens layer and/or a light reflection preventing layer via a transparent thermosetting resin layer, on a semiconductor substrate; forming a mask layer of a photosetting resin to expose an electrode on the semiconductor substrate surface after the layer forming and maintaining step; and exposing the electrode surface by selectively removing the transparent thermosetting resin layers by use of the mask layer. |
