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发明名称
Verfahren zum Erzeugen von Gräben mit einstellbarer Steilheit der Grabenwände in aus Silizium bestehenden Halbleitersubstraten
摘要
申请公布号
DE3613181(C2)
申请公布日期
1995.09.07
申请号
DE19863613181
申请日期
1986.04.18
申请人
SIEMENS AG, 80333 MUENCHEN, DE
发明人
ENGELHARDT, MANFRED, DIPL.-PHYS. DR.RER.NAT., 8011 BRUNNTHAL, DE
分类号
H01J37/32;H01L21/3065;H01L21/308;(IPC1-7):H01L21/308;H01L21/76
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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