| 摘要 |
PURPOSE:To obtain the title compact substrate automatic treatment apparatus capable of facilitating the maintenance and avoiding the re-pollution thereof once treated by a method wherein the device is to be provided with the treating means and a specific carrier means carrying the substrate for going around the treating positions by the treating means. CONSTITUTION:The title substrate automatic treatment apparatus is to be provided with the treating means 12-15 for required treatment of a substrate 20 and a carrier means carrying the substrate 20 for going around the treating positions by the treating means 12-15. On the other hand, the carrier means is provided with a supporting mechanism 22 capable of supporting the main surface periphery of the substrate 20 free-reciprocating in the first direction along the treating means 12-15 as well as holding mechanism 45-47 holding and releasing the substrate 20 in the direction in parallel with the main surface of the substrate 20 and free-reciprocating in the second direction intersecting with the first direction and delivering the substrate 20 to the supporting mechanism as well as bringing the same 20 to the treating positions furthermore, a holding mechanism shifting means for shifting the holding mechanisms 45-47. |
