FINE PATTERN FORMING MASK PLATE AND ITS PRODUCTION

摘要

PURPOSE:To produce a mask plate having a physical open window of framed pattern which is used when a part of the material layer constituting a semiconductor device under production is removed to form a specified fine pattern in the patterning stage. CONSTITUTION:This mask plate has a honeycomb sheet 72 having a principal plane having an area corresponding to a region to be patterned and the upper mask layers 73 and 74 provided in a specified region corresponding to the fine pattern. The honeycomb sheet 72 is pierced with many through-holes through which a reactive grain causing a chemical reaction with the material layer in the patterning stage is passed in the thickness direction The through-holes have a sufficiently fine structure to bring about the reaction of the reactive grain passed through the sheet 72 uniformly in one open window and are arranged with a sufficiently high density.