发明名称 |
Chemical vapor deposition method and apparatus making use of liquid starting material |
摘要 |
A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, pressure reducing means for reducing the pressure inside the container, and heating means for heating the liquid starting material held in the container; the liquid starting material being boiled.
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申请公布号 |
US5447568(A) |
申请公布日期 |
1995.09.05 |
申请号 |
US19920995039 |
申请日期 |
1992.12.22 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HAYAKAWA, YUKIHIRO;KAWASUMI, YASUSHI;MAKINO, KENJI;KATAOKA, YUZO |
分类号 |
C23C16/20;C23C16/44;C23C16/448;C23C16/452;C23C16/455;(IPC1-7):H01L21/20 |
主分类号 |
C23C16/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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