发明名称 Method for forming a pattern using a photosensitive composition comprising an alkali-soluble resin made from a phenolic compound and at least two different aldehydes
摘要 A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, as the main components, wherein the alkali-soluble resin is a polycondensation product of +E,crc/1/ at least one phenolic compound of the following formula (A) and +E,crc/2/ (a) formaldehyde and (b) at least one ketone or aldehyde of the following formula (B), and the mixing ratio of the formaldehyde (a) to the ketone or aldehyde (b) is within a range of from 1/99 to 99/1 in terms of the molar ratio of (a)/(b): roup of the formula R2,OR3,COOR4 or CH2COOR5,wherein R2 is a C1-4 alkyl group, each of R3,R4 and R5 which are independent of one another, is a hydrogen atom or a C1-4 alkyl group, n is an integer of from 0 to 3, provided that when n is 2 or 3, a plurality of R1 may be the same or different, and each of R6 and R7 which are independent of each other, is a hydrogen atom, a C1-4 lower alkyl group, an aryl group or an aralkyl group, provided that R6 and R7 are not simultaneously hydrogen atoms.
申请公布号 US5447825(A) 申请公布日期 1995.09.05
申请号 US19940299079 申请日期 1994.08.31
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 NISHI, MINEO;NAKANO, KOJI;TAKADA, YOSHIHIRO
分类号 G03F7/023;(IPC1-7):G03F7/30 主分类号 G03F7/023
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