| 摘要 |
PURPOSE:To provide a method and an apparatus for forming multilayer films wherein the characteristics of a multilayer film are improved. CONSTITUTION:Deposition material M is supplied in the vapor state to a substrate S, and multilayer films are formed one by one. In this method, the deposition material M is applied to the substrate S. Further, the deposition surface of the substrate S is heated by means of a heating light source 6 with energy to be supplied to the deposition surface varied depending on each layer to be formed. The title apparatus for implementing this method is equipped with a heating light source 6 for heating the deposition surface of the substrate S in a way that energy to be supplied to the deposition surface is variable. |
