| 摘要 |
PURPOSE:To prevent defect in processing using a coat-type developing method, to enable quick processing, to be excellent in maintenance, and to obtain a uniform print image by installing a heating unit in contact with a lithographic plate to be developed just before a developing solution coating device, and previously controlling the temperature of a lithographic plate to be developed. CONSTITUTION:A feed pipe 4 for a developing solution is forced to reciprocate in the cross direction to a lithographic plate M to feed a developing solution. A developing solution fed from a rod 3a for forming a sump simultaneously with feeding a developing solution is applied to a lithographic plate M transported, with the photosensitive surface up. A flat heating unit P is disposed just after transport rollers 2a, 2b and just before rods 3a,3b, and the heating unit P is controlled above a desired developing temperature by 10 deg.C to 25 deg.C. The heating unit P has a flat surface in the flow direction of the lithographic plate M. Otherwise, the contact area of the unit with the lithographic plate M is decreased so that satisfactory heating can not be performed. Though the width of the heating unit P to the cross direction of the lithographic plate M is free, at least it is preferably at least above the width of the lithographic plate M. |
