发明名称 Method and device for measuring quantities of impurities in special gas
摘要 PCT No. PCT/JP92/00605 Sec. 371 Date Jan. 31, 1994 Sec. 102(e) Date Jan. 31, 1994 PCT Filed May 13, 1992 PCT Pub. No. WO92/21966 PCT Pub. Date Dec. 10, 1992.A method and device for the quantitative measurement impurity in special gas at a level of ultra-high purity. After inert gas of ultra-high purity is supplied to a sample-gas pipe (14) through a purifier (1) (a first gas supply source), the inside of the sample-gas pipe (14) is baked by heating (22 to 24). Then, the inside of the sample gas (14) is kept in an atmosphere at a special temperature and a first and second changeover valves (9,10,16,17) are changed over so that a fixed quantity of special gas is supplied into the sample-gas pipe (14). Afterward, the special gas remaining in the sample-gas pipe (14) is discharged and the first and second changeover valves (9,10,16,17) are changed over so that impurities may be desorbed by baking the inside of the sample-gas pipe, and quantities of desorbed impurities are measured.
申请公布号 US5447053(A) 申请公布日期 1995.09.05
申请号 US19940150142 申请日期 1994.01.31
申请人 OHMI, TADAHIRO 发明人 OHMI, TADAHIRO
分类号 G01N27/62;G01N1/00;G01N13/00;G01N30/00;(IPC1-7):G01D18/00;G01N13/04 主分类号 G01N27/62
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