| 摘要 |
PURPOSE:To provide a managing apparatus for resist strippers, used to strip resist in liquid crystal substrate or semiconductor manufacturing processes, that maintains specific qualities of resist strippers and allows the reduction of quantity required, down time and cost. CONSTITUTION:The managing apparatus for resist strippers consists of a resist stripper discharge means that detects the concentration of resist dissolved in a resist stripper through an absorption spectrophotometer 16, and that discharges the resist stripper; a first replenishing means that detects the level of resist stripper through a level gauge 3, and that replenishes organic solvent and alkanol amine, such as MEA; and a second replenishing means that detects the concentration of alkanol amine, such as MEA, dissolved in resist stripper through an absorption spectrophotometer 15, and that replenishes either or both of organic solvent and alkanol amine, such as MEA. |
