| 摘要 |
This invention relates to a surface state inspection apparatus, and more particularly, to a surface state inspection apparatus which is suitable for detecting foreign particles or pattern defects on a pattern or on a surface of a photomask, a reticle or the like, serving as an original plate for pattern transfer in a semiconductor exposure apparatus. Light beams issued from a point to be inspected are guided to an aperture diaphragm using an optical system from a plurality of directions, and further, to a common detector. Hence, the present invention provides the effects that the amount of scattered light detected by the common detector can be greatly increased without providing a large condenser optical system, thereby increasing the S/N ratio, and a foreign particle or a defect at the point to be inspected is completely detected even if the outgoing direction of scattered light from the foreign particle or the defect has a peculiarity.
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