发明名称 |
Method and apparatus for a vertical flow material working system |
摘要 |
A material working system that includes a material conveyance connected to a support structure. The material conveyance extends adjacent the peripheral boundary of the support structure in a vertically downward direction. A plurality of sources of material and workstations are located at different vertical elevations adjacent the material conveyance.
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申请公布号 |
US5447223(A) |
申请公布日期 |
1995.09.05 |
申请号 |
US19940217450 |
申请日期 |
1994.03.24 |
申请人 |
SONY ELECTRONICS, INC. |
发明人 |
DASQUPTA, BASAB B. |
分类号 |
B23Q41/02;B23Q41/04;B65G21/18;(IPC1-7):B65G21/18 |
主分类号 |
B23Q41/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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