| 摘要 |
A projection exposure apparatus having an illuminating system for irradiating a mask having a pattern with illuminating light and a projection optical system for taking in light emanating from the pattern of the mask and for projecting an image of the pattern on a photosensitive substrate. The projection exposure apparatus further includes a phase plate disposed on or near a Fourier transform plane in an image-forming optical path between the mask and the photosensitive substrate so that the amplitude of light passing through a circular region of radius r1 which is centered at an optical axis of the projection optical system on the Fourier transform plane or a plane near it and the amplitude of light passing through an outer region while lies outwardly of the circular region are made different in sign from each other by the phase plate, and a movable member for moving an image-forming plane of the projection optical system and the photosensitive substrate relative to each other along the optical axis of the projection optical system when the image of the mask pattern is projected on the photosensitive substrate. The radius r1 and the ratio t of the amplitude of light passing through the circular region to the amplitude light passing through the outer region are determined so as to satisfy the following condition: 0.85x(0.34+0.12t)</=r1/r2</=1.15x(0.34+0.12t) where r2 is the radius of a pupil plane of said projection optical system.
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