发明名称 POLYIMIDE PATTERN FORMING LAYERED PRODUCT AND PATTERN FORMING METHOD
摘要 PURPOSE:To simply form a desired polyimide pattern, that is, to achieve labor saving of pattern formation without an application process and an exposure- developing process in a field where to form a pattern. CONSTITUTION:A layered product where a polyamide acid layer is provided on an organic resin layer having a low decomposition temperature is manufactured and a pattern is formed on the polyamide acid layer of the layered product by an arbitrary means. In a field where to form a pattern, the layered product is made closely adhere to a glass substrate and heat-treated at a high temperature to change the polyamide acid into polyimide. Thus, a desired polyimide pattern is formed on the glass substrate, etc.
申请公布号 JPH07234525(A) 申请公布日期 1995.09.05
申请号 JP19940049744 申请日期 1994.02.22
申请人 NITTO DENKO CORP 发明人 HOTTA YUJI;OMOTE TOSHIHIKO;FUJII HIROFUMI;FUNADA YASUTO
分类号 G03F7/004;B32B27/34;G03F7/027;G03F7/40;H01L21/312;H05K3/28;(IPC1-7):G03F7/40 主分类号 G03F7/004
代理机构 代理人
主权项
地址