首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
TWO-HOT-ZONE LOW PRESSURE CHEMICAL DEPOSITION APPARATUS
摘要
申请公布号
KR950007250(Y1)
申请公布日期
1995.09.04
申请号
KR19920016610U
申请日期
1992.09.01
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
LEE, KIL - KWANG;AN, YONG - CHOL;JONG, U - IN
分类号
H01L21/205;(IPC1-7):H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
您可能感兴趣的专利
IMPIANTO DI MACINAZIONE
DISPOSITIVO DI FRENATURA, IN PARTICOLARE PER MOTOSLITTE, MUNITO DI DISPOSITIVO IDRAULICO DI STAZIONAMENTO E/O DI EMERGENZA
Restoring method and computer system
System and method for automatically determining an optimal power cap value
Information processing apparatus and control method thereof
Data processing apparatus
Secure credential unlock using trusted execution environments
Tagging mechanism for data path security processing
Apparatus, systems, and methods for nameless writes
Self-sizing dynamic cache for virtualized environments
Deduplication-aware page cache
Buffer controller, codec and methods for use therewith
Data transferring apparatus and data transferring method
Enhanced wireless USB protocol
Hierarchically disassembling messages
Layered access control for machine type communication devices
Identification and monitoring of distributed business transactions
Route control method and system, and route computing apparatus
Network management system and method for identifying and accessing quality of service issues within a communications network
Digital downloading jukebox system with user-tailored music management, communications, and other tools
