| 发明名称 |
CIRCUIT CHECKING METHOD FOR SEMICONDUCTOR |
| 摘要 |
etching a protecting film by using a plasma; scanning an ion beam current at one end of a semiconductor element contact chain; and detecting a secondary image produced by the scanning of the ion beam current. The ion beam is comprised of Ga ion. |
| 申请公布号 |
KR950009873(B1) |
申请公布日期 |
1995.09.01 |
| 申请号 |
KR19920026864 |
申请日期 |
1992.12.30 |
| 申请人 |
HYUNDAI ELECTRONIC IND. CO., LTD. |
发明人 |
KIM, HO - JONG;KIM, JONG - TAE |
| 分类号 |
G01R31/26;G01R31/02;H01L21/66;(IPC1-7):G01R31/26 |
主分类号 |
G01R31/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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