发明名称 A PROCESS FOR THE ELECTROPHORETIC DEPOSITION OF DEFECT-FREE METALLIC OXIDE COATINGS
摘要 A process for electrophoretically depositing a metal oxide coating onto a substrate (16) immersing an electrically conductive substrate (16) in a sol (10) that comprises metal hydrate particles suspended in a medium comprising an alcohol and water. A direct current potential is applied between the substrate (16) and an anode (26) immersed in the sol (10) to electrophoretically deposit metal hydrate particles from the sol (10) onto the substrate (16). Simultaneously, gas bubbles are passed over the substrate (16) to remove hydrogen that forms on the substrate (16) during electrophoretic deposition. The metal hydrate coated substrate (16) is then removed from the sol (10), and heated to dry the coating and transform the metal hydrate to its corresponding metal oxide.
申请公布号 WO9523246(A1) 申请公布日期 1995.08.31
申请号 WO1995US02053 申请日期 1995.02.17
申请人 UNITED TECHNOLOGIES CORPORATION 发明人 EMILIANI, MARIO, L.;SPENCE, JARRETT, L.
分类号 C25D13/02;(IPC1-7):C25D13/02 主分类号 C25D13/02
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