发明名称 High performance multi-zone illuminator module for semiconductor wafer processing
摘要 A high-performance multi-zone illuminator module (130) for directing optical energy onto a semiconductor wafer (60) in a device fabrication reactor to improve overall semiconductor wafer processing uniformity comprises a housing connectable to the wafer processing reactor and having a bottom side and a reflector mounted to the bottom side. The reflector comprises a plurality of concentric circular zones (190, 192, 194 or 270, 262, 266, 264) for reflecting optical energy that include a plurality of circularly distributed lamp sockets (185). Engaged within the lamp sockets (185) are a plurality of point-source lamps (196) for directing optical energy to the semiconductor wafer (60) surface. The point-source lamps (196) are associated with the reflector (184 and 186 or 276 and 277) for directing light toward the wafer. The lamps are associated within each circular zone to provide an approximately continuous and diffused light ring at the semiconductor wafer (60). The multiple circular lamp zones plus the center zone can be controlled independently to allow real-time wafer temperature uniformity slip-free control for uniform device processing over a wide range of wafer temperatures.
申请公布号 US5446825(A) 申请公布日期 1995.08.29
申请号 US19930114550 申请日期 1993.08.31
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 MOSLEHI, MEHRDAD M.;DAVIS, CECIL J.;MATTHEWS, ROBERT T.
分类号 C23C16/48;H01L21/00;(IPC1-7):H01L21/324;H01L21/205 主分类号 C23C16/48
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