MASK FOR EXPOSURE AND ITS PRODUCTION, METHOD FOR FORMING SURFACE FORM USING MASK FOR EXPOSURE, AND DEVICE FOR PRODUCING MASK FOR EXPOSURE

摘要

PURPOSE:To realize a mask for exposure having desired transmissivity distribution. CONSTITUTION:The mask for exposure having two-dimensional desired transmissivity distribution based on the form of a dot pattern and dot density distribution is obtained by arithmetically calculating the form of the dot pattern and the dot density distribution in accordance with the desired transmissivity distribution, and performing write to a photosensitive medium 30 while changing output from an output variable write device for optically writing the dot pattern by luminous fluxes from light source devices 10 and 22 capable of stepwise or consecutively changing the output in accordance with the form of the dot pattern and the dot density arithmetically calculated, and developing the medium 30 on which the dot pattern is written.