发明名称 |
Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process |
摘要 |
A contactless method and apparatus for in-situ chemical etch monitoring of an etching process during etching of a workpiece with a wet chemical etchant are disclosed. The method comprises steps of providing a base member having a reference surface; releasably securing the workpiece to the base member; providing at least two sensors disposed on the base member to be proximate to but not in contact with the outer perimeter of the workpiece surface; and monitoring an electrical characteristic between said at least two sensors, wherein a prescribed change in the electrical characteristic is indicative of a prescribed condition of the etching process.
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申请公布号 |
US5445705(A) |
申请公布日期 |
1995.08.29 |
申请号 |
US19940269865 |
申请日期 |
1994.06.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BARBEE, STEVEN G.;DATTA, MADHAV;HEINZ, TONY F.;LI, LEPING;RATZLAFF, EUGENE H.;SHENOY, RAVINDRA V. |
分类号 |
H01L21/66;H01L21/306;H01L21/3213;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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