发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE:To provide a radiation sensitive resin composition particularly excellent in resolution and pattern shape, having excellent sensitivity and developing property with excellent contrast and heat resistance and useful as a chemical amplification type resist. CONSTITUTION:The radiation sensitive resin composition contains a copolymer (A) expressed by a formula and a radiation sensitive acid initiator (B) or contains the copolymer (A), the acid initiator (B) and an alkali soluble resin (C). (where, each of (m) and (n) is an integers of number representing each recurring unit and satisfies the relation of 0.1<=(m)/(m+n)<0.6 and 0.4<(n)/(m+n)<=0.9. |
申请公布号 |
JPH07230169(A) |
申请公布日期 |
1995.08.29 |
申请号 |
JP19940268112 |
申请日期 |
1994.10.07 |
申请人 |
JAPAN SYNTHETIC RUBBER CO LTD |
发明人 |
YAMACHIKA MIKIO;KOBAYASHI HIDEKAZU;OTA TOSHIYUKI;TSUJI AKIRA |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039;G03F7/028 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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