发明名称 Process and device for emission spectorscopy
摘要 PCT No. PCT/DE92/00447 Sec. 371 Date Dec. 6, 1993 Sec. 102(e) Date Dec. 6, 1993 PCT Filed Jun. 2, 1992 PCT Pub. No. WO92/21957 PCT Pub. Date Dec. 10, 1992.Process for emission spectroscopy, particularly for laser emission spectroscopy, wherein the radiation emitted by the laser-induced plasma of the workpiece to be analyzed is decomposed by a spectrometer and at least one fraction of the found spectrum is transferred to a processing unit. In order to improve the process from the point of view of measurement precision and speed, it is carried out in such a manner that an influencing of the intensity of the plasma-inducing laser beam takes place depending on at least one emission-influencing parameter for the production of definite plasma states, this parameter being measured during plasma formation, and that the transfer of the found spectrum or of a fraction thereof to the processing unit is performed, as long as the measured plasma parameter is within a predetermined tolerance range (TI./.TII).
申请公布号 US5446538(A) 申请公布日期 1995.08.29
申请号 US19930157170 申请日期 1993.12.06
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 NOLL, REINHARD
分类号 G01N21/63;G01N21/71;(IPC1-7):G01N21/63 主分类号 G01N21/63
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