发明名称 Process for reinforcing a semiconductor wafer
摘要 A process is used for reinforcing a semiconductor wafer, where remaining bubbles in a hot-melt adhesive can be reduced in number and in size. A reinforced wafer adhering to a reinforcing plate with a heated and softened adhesive is kept in a lower ambient pressure than a standard atmosphere for a predetermined period for deaeration, and is cooled under a higher pressure than the deaeration pressure. A reinforcing plate has a groove on its adhering face.
申请公布号 US5445692(A) 申请公布日期 1995.08.29
申请号 US19930156920 申请日期 1993.11.24
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NITTA, TOSHIYUKI
分类号 H01L21/02;H01L21/58;H01L21/68;(IPC1-7):B32B31/20 主分类号 H01L21/02
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