发明名称 |
Process for reinforcing a semiconductor wafer |
摘要 |
A process is used for reinforcing a semiconductor wafer, where remaining bubbles in a hot-melt adhesive can be reduced in number and in size. A reinforced wafer adhering to a reinforcing plate with a heated and softened adhesive is kept in a lower ambient pressure than a standard atmosphere for a predetermined period for deaeration, and is cooled under a higher pressure than the deaeration pressure. A reinforcing plate has a groove on its adhering face.
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申请公布号 |
US5445692(A) |
申请公布日期 |
1995.08.29 |
申请号 |
US19930156920 |
申请日期 |
1993.11.24 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
NITTA, TOSHIYUKI |
分类号 |
H01L21/02;H01L21/58;H01L21/68;(IPC1-7):B32B31/20 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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