MANUFACTURING METHOD OF OPTICAL SWITCHING DEVICE ARRAY

摘要

mesa etching a semiconductor layer of a second conductivity type and the defined portion of a intrinsic multiple quantum well region so as to isolate between optical switch elements and to expose semiconductor layer of a second conductivity type; superimposing the isolated region and the quantum well region on the defined portion of the semiconductor layer of the second conductivity type so as to isolate the optical swith portion and the load portion; forming a first insulative film on remaining portion excepting the defined portions of the first and second conductivity type semiconductor layers; forming a second conductivity type electrode electrically connecting the first conductivity type semiconductor layer of the optical switch portion and the second conductivity type semiconductor layer of the load portion; and forming each first conductivity type electrode of the optical switch portion and the load portion on the defined portion of the first conductivity type semiconductor layer.