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发明名称
Verfahren und Vorrichtung zum Einspritzen von Komponenten in Plasma zur ICP-OES-Analyse.
摘要
申请公布号
DE69108763(T2)
申请公布日期
1995.08.24
申请号
DE19916008763T
申请日期
1991.01.14
申请人
CYTEC TECHNOLOGY CORP., WILMINGTON, DEL., US
发明人
POPIELSKI, STANLEY E., EAST LYME, CONNECTICUT 06333, US;HOLDSWORTH, MELVYN, FAIRFIELD, CONNECTICUT 06430, US
分类号
G01N21/01;G01N21/63;G01N21/71;G01N21/73;(IPC1-7):G01N21/35;G01J3/30
主分类号
G01N21/01
代理机构
代理人
主权项
地址
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