Process for the measurement of the thickness and refractive index of a thin film on a substrate, and a device for carrying out the process.

摘要

PCT No. PCT/DE91/00461 Sec. 371 Date Nov. 30, 1992 Sec. 102(e) Date Nov. 30, 1992 PCT Filed May 29, 1991 PCT Pub. No. WO91/19025 PCT Pub. Date Dec. 12, 1991.A process and apparatus for in situ measurement of the thickness of a thin film on a substrate using interference effects in the thin film. Thermal radiation of the substrate is utilized as a source of interfering bundles of electromagnetic radiation which intensity thereof is measured with a charge-coupled-device camera, and signal-processing electronics is utilized for determining in accordance with the Airy formula the thickness of the thin film on the substrate in the planar direction of the thin film and the index of refraction thereof. The low time constant for the measurement and evaluation enables the process for the recording of measurements be used for the control of coating or removal procedures.