发明名称 Method for conditioning a substrate for subsequent electroless metal deposition
摘要 Substrates are activated for subsequent metallization by contacting the substrate with a electrolyte in which reducing agents which are electrochemically generated in the electrolyte. The reducing agents are sorbed by the substrate which is contacted with a seeding medium to dispose on the substrate seed, preferably palladium seed for subsequent electroless and electrolytic metallization.
申请公布号 US5443865(A) 申请公布日期 1995.08.22
申请号 US19920859594 申请日期 1992.03.23
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 TISDALE, STEPHEN L.;VIEHBECK, ALFRED
分类号 C23C18/18;C23C18/20;(IPC1-7):B05D1/00 主分类号 C23C18/18
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