| 摘要 |
PURPOSE:To realize an alignment method through which the position of an alignment mark can be easily detected in a shorter time. CONSTITUTION:A dummy mark 22b and an alignment mark 22a formed on a substrate are successively scanned with a light flux, and signals S13 are obtained from the dummy mark 22b to calculate an amplification factor while the dummy mark 22b and the alignment mark 22a are scanned with a light flux. In succession, signals S15 obtained from the alignment mark 22a are amplified by the previously calculated amplification factor to detect the position of the alignment mark 22a. As mentioned above, an amplification factor required for detecting the position of an alignment mark can be calculated and set through a single scanning operation, and the position of the alignment mark can be detected by signals amplified by a previously calculated amplification factor. By this setup, the position of an alignment mark can be detected in a short time. |
