发明名称 Radial gate array cell
摘要 Gate width directions of transistors are taken in circumferential directions surrounding a certain point as a center. Or transistors are constructed by a plurality of straight lines extending in radial directions of the certain point and intersecting each other at the same angle. Hereby, basic cells can be assembled on a master slice symmetrically in plural directions. There are arranged in a mutual adjacent relation in which channel layers located under one opposing gate electrodes are formed into P channels and channel layers located under the other opposing gate electrodes are formed into N channels. Otherwise, there are arranged alternately with respect to P channels and N channels in an adjacent relation basic cells in which all channel layers located under all gate electrodes in the same basic cell are formed by any type of the P channel and the N channel.
申请公布号 US5444275(A) 申请公布日期 1995.08.22
申请号 US19930058665 申请日期 1993.05.10
申请人 KAWASAKI STEEL CORPORATION 发明人 KUGISHIMA, MASAHIRO;SATO, HIROYUKI;NARIISHI, MASAAKI;YAMAKAWA, NOBORU;YAMAMOTO, TAKAHIRO
分类号 H01L27/118;(IPC1-7):H01L27/118 主分类号 H01L27/118
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