发明名称 Non-volatile semiconductor memory device with a small distribution width of cell transistor threshold voltage after erasing data
摘要 A semiconductor memory device includes a silicon chip, a memory cell transistor formed in the chip, a charge pump circuit formed in the chip, for boosting a source potential to generate a boosted potential, and a switching circuit formed in the chip. The switching circuit switches the portions to which the boosted voltage is supplied, depending on whether data is being written or erased. When writing data, the boosted potential is led to a drain of the memory cell transistor. When erasing data, the boosted potential is led to a source of the memory cell transistor.
申请公布号 US5444655(A) 申请公布日期 1995.08.22
申请号 US19940243901 申请日期 1994.05.17
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YOSHIKAWA, KUNIYOSHI
分类号 G11C17/00;G11C16/06;G11C16/12;G11C16/14;H01L21/822;H01L21/8247;H01L27/04;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C7/00 主分类号 G11C17/00
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