| 摘要 |
PURPOSE:To enable the dielectric layer surface to be polished with high preci sion without being scratched by stone dust at all by a method wherein the dielectric layer surface is polished with stone dust softer than the dielectric layer itself to produce a reactant of both component materials of the dielectric layer and the stone dust to be mechanically removed later. CONSTITUTION:The surface of a dielectric layer 2 of an electrostatic chuck is polished with stone dust softer than the dielectric later 2 itself to create a locally high temperature and high pressure state so that a reactant of both component materials of the dielectric layer 2 and the stone dust may be chemically produced. Next, at least the reactant or the product produced after the decomposition of the reactant is mechanically removed out of the surface of the dielectric layer 2. For example, it is recommended that the dielectric layer 2 mainly comprises Al2O3 the stone dust comprises SiO2 and the reactant from the material comprising the dielectric layer 2 and the material comprising the stone dust mainly comprises kainite. Finally, the reactant is polished while feeding a polishing solution 6 containing SiO2 stone dust using a high rigid polisher 5. |
