| 摘要 |
PURPOSE:To obtain a semiconductor device which is inexpensive and has high reliability by preventing lowering in the yield of products due to dust generation and an increase in man-hours for management due to complication of an exposure device. CONSTITUTION:Recognition character patterns 13 composed of characters, numbers and symbols for identifying each of wafers or product chips are provided in the outside region of product chip patters 11 on a photomask substrate 12 to form a photomask 16. Prescribed recognition patterns for identification are transferred to the respective wafers or product chips limiting the areas and positions at the photomask blind of a reduction stepper by using this photomask 16, thereby, the wafers or product chips are made identifiable. |
