发明名称 |
Resist processing method |
摘要 |
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
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申请公布号 |
US5442416(A) |
申请公布日期 |
1995.08.15 |
申请号 |
US19940271675 |
申请日期 |
1994.07.07 |
申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON KYUSHU LIMITED |
发明人 |
TATEYAMA, KIYOHISA;AKIMOTO, MASAMI;USHIJIMA, MITSURU |
分类号 |
B29C31/00;G03F7/16;G03F7/20;G03F7/26;G03F7/30;H01L21/00;H01L21/677;(IPC1-7):G03D5/00 |
主分类号 |
B29C31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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