发明名称 Photosensitive resin composition comprising a polyimide precursor and a photosensitive diazoquinone
摘要 A photosensitive resin composition which is adapted for protecting articles and particularly, electronic parts, therewith comprises a polyimide precursor of the following general formula <IMAGE> a tetravalent organic group, each Y individually represents a divalent organic group, R1, R2 and R3 may be the same or different and represent a hydrogen atom or a monovalent organic group having form 1 to 10 carbon atoms, and p, q and m are, respectively, an integer of 1 or over, and a photosensitive diazoquinone compound.
申请公布号 US5441845(A) 申请公布日期 1995.08.15
申请号 US19940197519 申请日期 1994.02.16
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 OKINOSHIMA, HIROSHIGE;KATO, HIDETO
分类号 G03F7/022;C08G73/10;C08L79/00;C08L79/08;G03F7/023;G03F7/037;G03F7/038;G03F7/039;G03F7/075;H01L21/027;H01L21/312;H01L23/29;H01L23/31;H05K3/06;H05K3/28;(IPC1-7):G03F7/023 主分类号 G03F7/022
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