发明名称 Silicon carbide wafer bonded to a silicon wafer
摘要 A silicon carbide structure (10) and method capable of using existing silicon wafer fabrication facilities. A silicon wafer (20) is provided which has a first diameter. At least one silicon carbide wafer (30) is provided which has a given width and length (or diameter). The width and length (or diameter) of the silicon carbide wafer (30) are smaller than the diameter of the silicon wafer (20). The silicon wafer (20) and the silicon carbide wafer (30) are then bonded together. The bonding layer (58) may comprise silicon germanium, silicon dioxide, silicate glass or other materials. Structures such as MOSFET (62) may be then formed in silicon carbide wafer (30).
申请公布号 US5441911(A) 申请公布日期 1995.08.15
申请号 US19940263099 申请日期 1994.06.21
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 MALHI, SATWINDER
分类号 H01L21/20;H01L21/762;H01L29/10;H01L29/24;H01L29/786;(IPC1-7):H01L21/18 主分类号 H01L21/20
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