| 摘要 |
PURPOSE:To obtain a radiation sensitive resin compsn. for fine working having good balance of sensitivity, the rate of a residual film and resolution and excellent in etching resistance by incorporating an alkali-soluble resin and a specified radiation sensitive compd. CONSTITUTION:An alkali-soluble resin and a radiation sensitive compd. represented by the formula are incorporated. In the formula, D is H or 1,2- naphthoquinonediazido-5-(and/or-4-)sulfonyl, at least one of D's is 1,2- naphthoquinonediazido-5-(and/or-4-)sulfonyl, R is-H,-OHs alkyl, alkoxy, aryl, arylalkyl, acyl or acyloxy and each of (l) and (m) is an integer of 1 to 3. The alkali-soluble resin is, e.g. novolak resin, resol resin, polyvinyl phenol, poly(meth) acrylic acid, poly(meth)acrylic ester or a styrene-maleic acid copolymer but novolak resin is preferably used as the alkali-soluble resin. |
