发明名称 EVALUATION APPARATUS FOR HIGH-MOLECULAR MATERIAL AND QUALITY CONTROL METHOD FOR RESIST
摘要 PURPOSE:To determine the deteriorated state by connecting a gel permeation chromatographic apparatus (GPC) with a photodiode array detector (PAD), determining a chromatogram at the highest absorption wavelength of a photosensitive agent, anal then determining the ratio of the quantity of light absorbed by the components on the high molecular weight side to the total quantity of absorbed light based on the main peak of the photosensitive agent. CONSTITUTION:A trace of resist 9 is injected through a syringe 8 into a GPC 3 comprising a precolumn 1 and a column 2 while supplying a solvent 7 by means of a pump 6. The components of the resist 9, separated at the column 2 for every molecular weight, low through a piping 10 in the order of molecular weight. A PAD 4 detects the absorbance simultaneously for the wavelength of about 200-800nm and the absorbance is processed through a data processor 5 thus determining the elution time dependency of the absorbance. Absorption of photosensitive agent is detected upon the lapse of 85 to 90min with the wavelength of 352nm as a maximal. In the chromatogram at that wavelength, the ratio of light absorption on the high molecular weight side of the main peak of photosensitive agent to the total light absorption is determined thus determining the deteriorated state.
申请公布号 JPH07209275(A) 申请公布日期 1995.08.11
申请号 JP19940004750 申请日期 1994.01.20
申请人 FUJITSU LTD 发明人 MIZUSHIMA MASAKO;HIROSE MINORU
分类号 B01J20/281;G01N30/74;G01N30/88;G03F7/26;(IPC1-7):G01N30/88;G01N30/48 主分类号 B01J20/281
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