| 摘要 |
Phenyl acetic acid derivatives of formula (I) in which the substituents and index have the following meanings: X is oxygen or sulphur; R is hydrogen and alkyl; R1 is hydrogen and alkyl; R2 is cyano, nitro, trifluoromethyl, halogen, alkyl and alkoxy; m is 0, 1 ou 2, in which the radicals R2 may be different if m is 2; R3 is hydrogen, cyano, nitro, hydroxy, amino, halogen, alkyl, halogen alkyl, alkoxy, halogen alkoxy, alkylthio, alkylamino or dialkylamino; R4 is hydrogen, cyano, nitro, hydroxy, amino, halogen, possibly substituted alkyl, alkoxy, alkylthio, alkylamino, dialkylamino, alkenyl, alkenyloxy, alkenylthio, alkenylamino, N-alkenyl-N-alkylamino, alkinyl, alkinyloxy, alkinylthio, alkinylamino, N-alkinyl-N-alkylamino; optionally substituted cycloalkyl, cycloalkyloxy, cycloalkylthio, cycloalkylamino, N-cycloalkyl-N-alkylamino, cycloalkenyl, cycloalkenyloxy, cycloalkenylthio, cycloalkenylamino, Ncycloalkenyl-N-alkylamino, heterocyclyl, heterocyclyloxy, heterocyclylthio, heterocyclylamino, N-heterocylcyl-N-alkylamino, aryl, aryloxy, arylthio, arylamino, n-aryl-n-alkylamino, hetaryl, hetaryloxy, hetarylthio, hetarylamino, N-hetaryl-N-alkylamino; R5 is hydrogen, optionally substituted alkyl, cycloalkyl, alkenyl, alkinyl, alkylcarbonyl, alkenylcarbonyl, alkinylcarbonyl or alkylsulfonyl; optionally substituted aryl, arylcarbonyl, arylsulfonyl, hetaryl, hetarylcarbonyl or hetarylsulphonyl; and their salts, process and intermediate products for their production, and their use.
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