发明名称 Verfahren zur Herstellung einer Anordnung und Maskgruppe dazu.
摘要 A method and group of masks for manufacturing a device whereby illumination of a photoresist layer (4) takes place by subsequent illumination through partial masks (1) and (2). During these separate illuminations, complementary scales of grey are obtained in the connection region (7, 8) of the images (5, 6), the total illumination in the connection region (7, 8) being nevertheless complete. According to the invention, good results are obtained when the partial masks (1) and (2) have complementary transparency gradients in the ends (9, 10) corresponding to the scales of grey. Figs. 1a and 1b. <IMAGE>
申请公布号 DE69020704(D1) 申请公布日期 1995.08.10
申请号 DE1990620704 申请日期 1990.12.13
申请人 PHILIPS ELECTRONICS N.V., EINDHOVEN, NL 发明人 GEMMINK, JAN WILLEM, NL-5656 AA EINDHOVEN, NL;GEERTS, WILHELMUS HENDRIKUS MARIA, NL-5656 AA EINDHOVEN, NL;DISSEL, MARCEL, NL-5656 AA EINDHOVEN, NL
分类号 G02F1/1362;G03F1/00;G03F7/20;H01L21/027;H01L21/30 主分类号 G02F1/1362
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