| 摘要 |
The method forms a black matrix layer which is placed in filter pattern and R,G,B color layers to planar structure, and removes the over coat layer which flats the filter surface. The device comprises a conduction electrode pattern which has a space of base electrode on the transparent glass, a 1st color and a 3rd color filter layers, a light protection layer, and a transparent electrode layer which is formed on the color filter layer and light protection layer. The conduction electrode is ITO. The conduction electrode pattern is a stripe, mosaic, or tri-angle type. The transparent electrode layer is formed by RF magnetron sputter.
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