发明名称 Method of growing a semiconductor layer and a fabrication method of a semiconductor device using such a semiconductor layer
摘要 A method of fabricating a compound semiconductor device includes the steps of supplying an amine-adduct of a compound that contains a constituent element of a crystal layer that forms the semiconductor device, to a substrate on which the semiconductor device is formed, as a source material of the crystal layer, decomposing the amine-adduct in the vicinity of the substrate such that the constituent element is released, and depositing the constituent element on the substrate to cause a growth of the crystal layer on the substrate.
申请公布号 US5438952(A) 申请公布日期 1995.08.08
申请号 US19940189147 申请日期 1994.01.31
申请人 FUJITSU LIMITED 发明人 OTSUKA, NOBUYUKI
分类号 H01L21/203;C30B25/02;H01L21/205;H01L21/338;H01L21/363;H01L29/778;H01L29/812;H01L33/06;H01L33/28;H01L33/30;H01L33/34;H01S5/00;(IPC1-7):C30B25/02 主分类号 H01L21/203
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