发明名称 Method for treating ozone layer depleting substances
摘要 A method for treating ozone layer depleting substances, in which a gaseous composition comprising helium or argon or a mixture thereof, or a gaseous mixture of argon and acetone, is introduced into a plasma reactor having a dielectric-coated electrode comprising a solid dielectric disposed on the surface of at least one of opposing electrodes, an atmospheric pressure glow discharge is generated in the gaseous atmosphere, gaseous ozone layer depleting substances are introduced into the glow discharge to decompose the substances, and resulting decomposition products are absorbed in water.
申请公布号 US5439568(A) 申请公布日期 1995.08.08
申请号 US19930163077 申请日期 1993.12.08
申请人 E. C. CHEMICAL CO., LTD.;ITOCHU FINE CHEMICAL CORPORATION 发明人 UCHIYAMA, HIROSHI
分类号 A62D101/22;B01D53/32;B01D53/34;B01D53/70;(IPC1-7):H05F3/00 主分类号 A62D101/22
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