发明名称 High-temperature electrical contact for making contact to ceramic materials and improved circuit element using the same
摘要 A method for connecting a silicon substrate to an electrical component via a platinum conductor. The resulting structure may be heated in the presence of oxygen to temperatures in excess of 800 DEG C. without destroying the electrical connection between the silicon substrate and components connected to the platinum conductor. The present invention utilizes a TiN or TiW buffer layer to connect the platinum conductor to the silicon substrate. The buffer layer is deposited as a single crystal on the silicon substrate. The platinum layer is then deposited on the buffer layer. The region of the platinum layer in contact with the buffer layer is also a single crystal.
申请公布号 US5440173(A) 申请公布日期 1995.08.08
申请号 US19930123289 申请日期 1993.09.17
申请人 RADIANT TECHNOLOGIES 发明人 EVANS, JR., JOSEPH T.;BULLINGTON, JEFF A.
分类号 H01L21/02;H01L27/115;(IPC1-7):H01L29/43 主分类号 H01L21/02
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