| 摘要 |
PURPOSE: To provide a lighting means for a projection exposure device for microlithography which selectively enters various different lighting modes, including conventional lighting accompanied by an adjustable interference coefficient, annular aperture lighting, and symmetrical oblique lighting from two or four directions. CONSTITUTION: Pieces of luminous flux emitted by a light source 1 are captured individually at two or four solid angle tilt directions, shaped or cut off, and imaged on sectors on a pupil plane 93 after a Fourier-transform with respect to the reticle plane of a reticle 10 to be imaged, and the radial position and azimuth angle of the image of luminous flux on the pupil plane 93 are varied. |
